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Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces
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SYSNO ASEP 0382471 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces Author(s) Baše, Tomáš (UACH-T) RID, SAI, ORCID
Bastl, Zdeněk (UFCH-W) RID, ORCID
Havránek, Vladimír (UJF-V) RID, SAI, ORCID
Macháček, Jan (UACH-T) RID, ORCID, SAI
Langecker, Jens (UACH-T) SAI
Malina, Václav (URE-Y)Source Title Langmuir. - : American Chemical Society - ISSN 0743-7463
Roč. 28, č. 34 (2012), s. 12518-12526Number of pages 9 s. Language eng - English Country US - United States Keywords copper surfaces ; carboranethiols ; cluster ; chemisorption ; self-assembled monolayer Subject RIV CA - Inorganic Chemistry Subject RIV - cooperation J. Heyrovsky Institute of Physical Chemistry - Physical ; Theoretical Chemistry R&D Projects GAP205/10/0348 GA ČR - Czech Science Foundation (CSF) KAN100400702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) Institutional support UACH-T - RVO:61388980 ; UFCH-W - RVO:61388955 ; UJF-V - RVO:61389005 ; URE-Y - RVO:67985882 UT WOS 000307988700013 DOI 10.1021/la302334x Annotation Two different positional isomers of 1,2-dicarba-closo-dodecaboranedithiols, 1,2-(HS)(2)-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been investigated as cluster building blocks for self-assembled monolayers (SAMs) on copper surfaces. These two isomers represent a convenient system in which the attachment of SH groups at different positions on the skeleton affects their acidic character and thus also determines their reactivity with a copper surface. Isomer 1 exhibited etching of polycrystalline Cu films, and a detailed investigation of the experimental conditions showed that both the acidic character of SH groups and the presence of oxygen at the copper surface play crucial roles in how the surface reaction proceeds: whether toward a self-assembled monolayer or toward copper film etching. We found that each positional isomer requires completely different conditions for the preparation of a SAM on copper surfaces Both isomers exhibited high capacity to remove oxygen atoms from the surface copper(I) oxide that forms immediately after the exposure of freshly prepared copper films to ambient atmosphere. Isomer 2 showed suppression of Cu film oxidation. A number of methods including X-ray photoelectron spectroscopy (XPS), X-ray Rutherford back scattering (RBS), proton-induced X-ray emission (PIXE) analysis, atomic force microscopy (AFM), cyclic voltammetry, and contact angle measurements were used to investigate the experimental conditions for the preparation of SAMs of both positional isomers on copper surfaces and to shed light on the interaction between these molecules and a polycrystalline copper surface. Workplace Institute of Inorganic Chemistry Contact Jana Kroneislová, krone@iic.cas.cz, Tel.: 311 236 931 Year of Publishing 2013
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