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Influence of CO.sub.2./sub. concentration on diamond film morphology in pulsed linear antenna microwave plasma CVD system
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SYSNO ASEP 0375441 Document Type K - Proceedings Paper (Czech conf.) R&D Document Type Conference Paper Title Influence of CO2 concentration on diamond film morphology in pulsed linear antenna microwave plasma CVD system Author(s) Domonkos, M. (CZ)
Ižák, Tibor (FZU-D) RID
Babchenko, Oleg (FZU-D) RID, ORCID
Kromka, Alexander (FZU-D) RID, ORCID, SAI
Hruška, Karel (FZU-D) RID, ORCIDSource Title Proceedings of the 2nd Winter Education Seminar. - Praha : FZÚ AV ČR, 2011 / Remeš Z. ; Kromka A. ; Ledinský M. - ISBN 978-80-260-0911-5
S. 33-37Number of pages 5 s. Action Winter educational seminar /2./ Event date 16.02.2011-18.02.2011 VEvent location Rokytnice n. J. Country CZ - Czech Republic Event type CST Language eng - English Country CZ - Czech Republic Keywords nanocrystalline diamond ; large area growth ; growth rate ; CO2 addition ; SEM ; Raman Spectroscopy Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects MEB0810082 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) KAN400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) IAAX00100902 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) MEB0810081 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z10100521 - FZU-D (2005-2011) Annotation The diamond films were deposited in a pulsed linear antenna microwave plasma system. The influence of CO2 addition into the standard CH4/H2 gas mixture on the diamond film morphology was investigated. The concentration of CO2 varied from 0% up to 80% in CO2/CH4/H2 gas mixture. The film morphology, the growth rate and the ratio of sp3/sp2 carbon bonds were investigated. It was found that increasing of CO2 concentration resulted in enhanced growth rate (from 20 up to 36 nm/h). However, at very high CO2 concentrations (>40%) dominates etching instead of growth process. Moreover, we found that increasing of CO2 enhances the diamond film quality. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2012
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