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Influence of CO.sub.2./sub. concentration on diamond film morphology in pulsed linear antenna microwave plasma CVD system

SYSNO ASEP	0375441
Document Type	K - Proceedings Paper (Czech conf.)
R&D Document Type	Conference Paper
Title	Influence of CO₂ concentration on diamond film morphology in pulsed linear antenna microwave plasma CVD system
Author(s)	Domonkos, M. (CZ) Ižák, Tibor (FZU-D)_RID Babchenko, Oleg (FZU-D)_{RID, ORCID} Kromka, Alexander (FZU-D)_{RID, ORCID, SAI} Hruška, Karel (FZU-D)_{RID, ORCID}
Source Title	Proceedings of the 2nd Winter Education Seminar. - Praha : FZÚ AV ČR, 2011 / Remeš Z. ; Kromka A. ; Ledinský M. - ISBN 978-80-260-0911-5 S. 33-37
Number of pages	5 s.
Action	Winter educational seminar /2./
Event date	16.02.2011-18.02.2011
VEvent location	Rokytnice n. J.
Country	CZ - Czech Republic
Event type	CST
Language	eng - English
Country	CZ - Czech Republic
Keywords	nanocrystalline diamond ; large area growth ; growth rate ; CO2 addition ; SEM ; Raman Spectroscopy
Subject RIV	BM - Solid Matter Physics ; Magnetism
R&D Projects	MEB0810082 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	KAN400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	IAAX00100902 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	MEB0810081 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
CEZ	AV0Z10100521 - FZU-D (2005-2011)
Annotation	The diamond films were deposited in a pulsed linear antenna microwave plasma system. The influence of CO2 addition into the standard CH4/H2 gas mixture on the diamond film morphology was investigated. The concentration of CO2 varied from 0% up to 80% in CO2/CH4/H2 gas mixture. The film morphology, the growth rate and the ratio of sp3/sp2 carbon bonds were investigated. It was found that increasing of CO2 concentration resulted in enhanced growth rate (from 20 up to 36 nm/h). However, at very high CO2 concentrations (>40%) dominates etching instead of growth process. Moreover, we found that increasing of CO2 enhances the diamond film quality.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2012

Number of the records: 1