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The mechanism of the photocatalytic degradation of oleic acid on efficient self-cleaning surfaces

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    SYSNO ASEP0369164
    Document TypeC - Proceedings Paper (int. conf.)
    R&D Document TypeConference Paper
    TitleThe mechanism of the photocatalytic degradation of oleic acid on efficient self-cleaning surfaces
    Author(s) Rathouský, Jiří (UFCH-W) RID, ORCID
    Kalousek, Vít (UFCH-W)
    Jirkovský, Jaromír (UFCH-W) RID
    Source TitleProceedings 2011 World Congress on Engineering and Technology. - Shanghai : IEEE, 2011 - ISBN 978-1-61284-363-6
    Pagess. 0981-1948701
    Number of pages4 s.
    Publication formCD-ROM - CD-ROM
    Action2011 World Congress on Engineering and Technology
    Event date28.10.2011-02.11.2011
    VEvent locationShanghai
    CountryCN - China
    Event typeWRD
    Languageeng - English
    CountryCN - China
    KeywordsTiO2 ; photocatalysis ; mesoporous layers
    Subject RIVCF - Physical ; Theoretical Chemistry
    R&D ProjectsDF11P01OVV012 GA MK - Ministry of Culture (MK)
    AnnotationThin films of titanium dioxide exhibiting developed mesoporosity with large surface area and pores ca 10 nm in size were shown efficient photocatalysts in the decomposition of thin layers of oleic acid deposited on their surface. The pore walls of these films were composed of small anatase nanocrystals and some amorphous phase. Nonanal and 9-oxononanoic acid were identified as major intermediates of the oleic acid decomposition, while azelaic and nonanoic acids represented minor ones. These compounds corresponded with the products of a simulated oxidative degradation of cis-3-hexenoic acid computed by means of quantum chemistry. Cis-3-hexenoic acid was chosen as a simplified model of oleic acid having similar but reduced structure, which enabled to perform the theoretical study with a reasonable consumption of computation time. The simulated oxidative degradation of cis-3-hexenoic acid was induced by an attack of hydroxyl radical on the C=C double bond.
    WorkplaceJ. Heyrovsky Institute of Physical Chemistry
    ContactMichaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196
    Year of Publishing2012
Number of the records: 1  

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