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AFM nanometrology interferometric system with the compensation of angle errors

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    SYSNO ASEP0367516
    Document TypeC - Proceedings Paper (int. conf.)
    R&D Document TypeConference Paper
    TitleAFM nanometrology interferometric system with the compensation of angle errors
    Author(s) Hrabina, Jan (UPT-D) RID, ORCID, SAI
    Lazar, Josef (UPT-D) RID, ORCID, SAI
    Klapetek, P. (CZ)
    Číp, Ondřej (UPT-D) RID, SAI, ORCID
    Number of authors4
    Source TitleOptical Measurement Systems for Industrial Inspection VII (Proceedings of SPIE Vol. 8082). - Bellingham : SPIE, 2011 - ISBN 978-0-8194-8678-3
    Pages80823u:1-6
    Number of pages6 s.
    ActionOptical Measurement Systems for Industrial Inspection VII
    Event date23.05.2011-26.05.2011
    VEvent locationMunich
    CountryDE - Germany
    Event typeWRD
    Languageeng - English
    CountryUS - United States
    Keywordsatomic force microscopy (AFM) ; nanometrology ; nanoscale ; nanopositioning ; interferometry ; abbe errors
    Subject RIVBH - Optics, Masers, Lasers
    R&D ProjectsLC06007 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    2C06012 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    2A-1TP1/127 GA MPO - Ministry of Industry and Trade (MPO)
    FT-TA3/133 GA MPO - Ministry of Industry and Trade (MPO)
    2A-3TP1/113 GA MPO - Ministry of Industry and Trade (MPO)
    GA102/09/1276 GA ČR - Czech Science Foundation (CSF)
    GA102/07/1179 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z20650511 - UPT-D (2005-2011)
    UT WOS000295076900133
    DOI10.1117/12.889544
    AnnotationThe contribution is oriented towards measuring in the nanoscale through local probe microscopy techniques, primarily the AFM microscopy. The need to make the AFM microscope a nanometrology tool not only the positioning of the tip has to be based on precise measurements but the traceability of the measuring technique has to be ensured up to the primary standard. This leads to the engagement of laser interferometric measuring methods. We present a improved design of the six-axes dimensional interferometric measurement tool for local probe microscopy stage nanopositioning with the compensation system of angle errors. The setup is powered with the help of a single-frequency frequency-doubled Nd:YAG laser which is stabilized by thermal frequency control locked to a Doppler-broadened absorption line in iodine. The laser stabilization technique is described together with comparison of frequency stability and angle errors compensation system performance.
    WorkplaceInstitute of Scientific Instruments
    ContactMartina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
    Year of Publishing2012
Number of the records: 1  

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