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GaAsSb strain reducing layers for InAs/GaAs quantum dot long wavelength and high efficiency emission

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    SYSNO ASEP0367155
    Document TypeC - Proceedings Paper (int. conf.)
    R&D Document TypeConference Paper
    TitleGaAsSb strain reducing layers for InAs/GaAs quantum dot long wavelength and high efficiency emission
    Author(s) Hospodková, Alice (FZU-D) RID, ORCID, SAI
    Pangrác, Jiří (FZU-D) RID, ORCID, SAI
    Oswald, Jiří (FZU-D) RID, ORCID
    Kuldová, Karla (FZU-D) RID, ORCID
    Vyskočil, Jan (FZU-D) RID
    Hulicius, Eduard (FZU-D) RID, ORCID, SAI
    Hazdra, P. (CZ)
    Source TitleEWMOVPE XIV. - Wroclaw : Printing house of Wroclaw University of Technology, 2011 / Prazmowska J. - ISBN 978-83-7493-599-9
    Pagess. 105-108
    Number of pages4 s.
    ActionEuropean Workshop on Metalorganic Vapor Phase Epitaxy /14./
    Event date05.06.2011-08.06.2011
    VEvent locationWrocław
    CountryPL - Poland
    Event typeEUR
    Languageeng - English
    CountryPL - Poland
    Keywordsquantum dot ; InAs ; GaAs ; GaAsSb strain reducing layer ; photoluminescence
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsGAP102/10/1201 GA ČR - Czech Science Foundation (CSF)
    GA202/09/0676 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z10100521 - FZU-D (2005-2011)
    AnnotationIn this work we report the photoluminescence (PL) at maximum wavelength 1391 nm on MOVPE prepared InAs/GaAs quantum dots (QDs) with GaAsSb strain reducing layer (SRL) maintaining the type I heterojunction between QDs and GaAsSb SRL. We present the shift of PL maximum towards longer wavelengths with increasing Sb content in SRL. This type of structure increases strongly PL efficiency, redshifts the PL peak, decreases its full width at half maximum and maintains a similar energy separation between the ground state and excited state in comparison to QDs covered only by GaAs. These properties are promising for the use of GaAsSb SRL in QD devices.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2012
Number of the records: 1  

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