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Characterization and optical properties of TiO.sub.2./sub. prepared by pulsed laserdeposition
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SYSNO ASEP 0366495 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Characterization and optical properties of TiO2 prepared by pulsed laserdeposition Author(s) Kádár, O. (HU)
Uherek, F. (SK)
Chlpík, J. (SK)
Remsa, Jan (FZU-D) RID, ORCID
Bruncko, J. (SK)
Vincze, A. (SK)
Jelínek, Miroslav (FZU-D) RID, ORCIDSource Title ASDAM 2010-Conference Proceedings-The Eighth International Conference on Advanced Semiconductor Devices and Microsystems. - Piscataway : IEEE, 2010 / Breza J. ; Donoval D. ; Vavrinsky E. - ISBN 978-1-4244-8575-8 Pages s. 301-304 Number of pages 4 s. Action International Conference on Advanced Semiconductor Devices and Microsystems /8./ Event date 25.10.2010-27.10.2010 VEvent location Smolenice Country SK - Slovakia Event type WRD Language eng - English Country US - United States Keywords titanium dioxide ; pulsed laser deposition ; waveguides Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects MEB0810156 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z10100522 - FZU-D (2005-2011) Annotation The contribution reports on fabrication and characterization of TiO2 thin films on Si substrate. The TiO2 thin films are used for photonic devices in optical communication systems. The most important parameter for the waveguide structures is the refractive index. The crystalline TiO2 polymorphs can have different refractive index depending on the structure phase, which is technology dependent. The waveguide structures was prepared by pulsed laser deposition using 248 nm KrF laser source and targets of Ti or rutile in oxygen atmosphere. The optical characterization were done using spectroscopic ellipsometry providing the information about electron band gap values and determining the optical parameters (thickness and refractive index) of prepared TiO2 thin films. Secondary ion mass spectroscopy (SIMS) and secondary electron microscopy (SEM) was done to verify the vertical and chemical structure. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2012
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