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FIB Induced Damage Examined with the Low Energy SEM

SYSNO ASEP	0365942
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	FIB Induced Damage Examined with the Low Energy SEM
Author(s)	Mikmeková, Šárka (UPT-D)_{RID, SAI, ORCID} Matsuda, K. (JP) Watanabe, K. (JP) Ikeno, S. (JP) Müllerová, Ilona (UPT-D)_{RID, SAI, ORCID} Frank, Luděk (UPT-D)_{RID, SAI, ORCID}
Number of authors	6
Source Title	Materials Transactions. - : Japan Institute of Metals and Materials - ISSN 1345-9678 Roč. 52, č. 3 (2011), s. 292-296
Number of pages	5 s.
Language	eng - English
Country	JP - Japan
Keywords	scanning low energy electron microscopy ; focused ion beam ; beam induced damage ; sputtering
Subject RIV	JA - Electronics ; Optoelectronics, Electrical Engineering
R&D Projects	OE08012 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
CEZ	AV0Z20650511 - UPT-D (2005-2011)
UT WOS	000290461000006
EID SCOPUS	79955786544
DOI	10.2320/matertrans.MB201005
Annotation	The surface morphology of pure Mg was studied by means of the cathode lens mode equipped scanning low energy electron microscope after bombarding with Ga(+) ions at various energies (10, 20, 30, and 40 keV) and incident angles (0 degrees, 30 degrees, 45 degrees, and 60 degrees). In accordance with the Bradley-Harper theory at off-normal angles of incidence ripples were observed on the irradiated areas. The Monte Carlo program SRIM2008 was used to estimate the sputtering yield and damage depth.
Workplace	Institute of Scientific Instruments
Contact	Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
Year of Publishing	2012

Number of the records: 1