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Optical characterization of HfO(2) thin films

SYSNO ASEP	0365941
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Optical characterization of HfO(2) thin films
Author(s)	Franta, D. (CZ) Ohlídal, I. (CZ) Nečas, D. (CZ) Vižďa, F. (CZ) Caha, O. (CZ) Hasoň, M. (CZ) Pokorný, Pavel (UPT-D)_{RID, SAI, ORCID}
Number of authors	7
Source Title	Thin Solid Films. - : Elsevier - ISSN 0040-6090 Roč. 519, č. 18 (2011), s. 6085-6091
Number of pages	7 s.
Language	eng - English
Country	CH - Switzerland
Keywords	optical properties ; ellipsometry ; spectrophotometry ; hafnium oxide ; transition-metal oxide ; Urbach tail
Subject RIV	JK - Corrosion ; Surface Treatment of Materials
CEZ	AV0Z20650511 - UPT-D (2005-2011)
UT WOS	000292576500042
DOI	10.1016/j.tsf.2011.03.128
Annotation	Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail.
Workplace	Institute of Scientific Instruments
Contact	Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
Year of Publishing	2012

Number of the records: 1