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Chapter 8: Preparation and Characterization of TiO(2)-Based Photocatalysts by Chemical Vapour Deposition

SYSNO ASEP	0361557
Document Type	C - Proceedings Paper (int. conf.)
R&D Document Type	Conference Paper
Title	Chapter 8: Preparation and Characterization of TiO(2)-Based Photocatalysts by Chemical Vapour Deposition
Author(s)	Nacevski, G. (MK) Marinkovski, M. (MK) Tomovska, R. (ES) Fajgar, Radek (UCHP-M)_{RID, ORCID, SAI}
Source Title	Nanotechnological Basis for Advanced Sensors. - Dordrecht : Springer Science, 2011 / Reithmaier J.P. ; Paunovic P. ; Kulisch W. ; Popov C. ; Petkov P. - ISSN 1871-465X - ISBN 978-94-007-0902-7
Pages	s. 65-71
Number of pages	7 s.
Action	NATO-Advanced-Study-Institute Conference on Nanotechnological Basis for Advanced Sensors
Event date	30.05.2010-11.06.2010
VEvent location	Sozopol
Country	BG - Bulgaria
Event type	WRD
Language	eng - English
Country	NL - Netherlands
Keywords	TiO(2)-based photocatalysts ; TiO(2)/SiO(2) mixed oxides ; laser induced CVD
Subject RIV	CF - Physical ; Theoretical Chemistry
CEZ	AV0Z40720504 - UCHP-M (2005-2011)
UT WOS	000292658400008
Annotation	In the present work, a novel technique for the preparation of TiO(2)-based photocatalysts modified with SiO(2) is presented, using a pulsed ArF laser to induce a chemical vapor deposition process. The irradiated gas mixture was composed of TiCl(4)/SiCl(4) precursors in excess of oxygen. Laser irradiation at 193 nm with a repetition frequency of 10 Hz induced the deposition of thin nano-sized mixed oxide films. The main aim was to find the best conditions for the production of highly photoactive catalysts and to decrease deactivation processes during the photo-oxidation. The composition, structure and morphology of the oxide catalysts prepared were studied by various spectroscopies, electron microscopy and diffraction techniques.
Workplace	Institute of Chemical Process Fundamentals
Contact	Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
Year of Publishing	2012

Number of the records: 1