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ArF Laser Photolytic Deposition and Thermal Modification of an Ultrafine Chlorohydrocarbon
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SYSNO ASEP 0361345 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title ArF Laser Photolytic Deposition and Thermal Modification of an Ultrafine Chlorohydrocarbon Author(s) Pola, Josef (UCHP-M) RID, ORCID, SAI
Galíková, Anna (UCHP-M)
Šubrt, Jan (UACH-T) SAI, RID
Ouchi, A. (JP)Source Title Chemical Papers. - : Springer - ISSN 0366-6352
Roč. 64, č. 5 (2010), s. 625-629Number of pages 5 s. Action International Conference of the Slovak Society of Chemical-Engineering /37./ Event date 24.05.2010-28.05.2010 VEvent location Tatranské Matliare Country SK - Slovakia Event type EUR Language eng - English Country SK - Slovakia Keywords laser-induced photolysis ; cis-1,2-dichloroethene ; nanostructured chlorohydrocarbon Subject RIV CH - Nuclear ; Quantum Chemistry CEZ AV0Z40720504 - UCHP-M (2005-2011) AV0Z40320502 - UACH-T (2005-2011) UT WOS 000280919800012 DOI 10.2478/s11696-010-0048-0 Annotation MW ArF laser irradiation of gaseous cis-dichloroethene results in fast decomposition of this compound and in deposition of solid ultrafine Cl- and H-containing carbonaceous powder which is of interest due to its sub-microscopic structure and possible reactive modification of the C-Cl bonds. The product was characterized by electron microscopy, and FTIR and Raman spectra and it was revealed that HCl, H(2), and C/H fragments are lost and graphitic features are adopted upon heating to 700A degrees C. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2012
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