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Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system
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SYSNO ASEP 0358552 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system Author(s) Virostko, Petr (FZU-D)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Čada, Martin (FZU-D) RID, ORCID, SAI
Tichý, M. (CZ)Source Title Journal of Physics D-Applied Physics. - : Institute of Physics Publishing - ISSN 0022-3727
Roč. 43, č. 12 (2010), s. 1-7Number of pages 7 s. Language eng - English Country GB - United Kingdom Keywords plasma ; pulsed DC ; ion flux ; hollow cathode Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GP202/09/P159 GA ČR - Czech Science Foundation (CSF) GA202/09/0800 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000275435200020 DOI 10.1088/0022-3727/43/12/124019 Annotation A current of positive ions to a substrate was studied in the pulsed dc hollow cathode plasma jet system for deposition of thin films working at low pressures. The time evolution of the ion current density to the probe ji was determined for the whole period of modulation of the discharge for a discharge repetition frequency of 2.5 kHz and different duty cycles D. The mean ion current density , averaged over the whole period of the discharge, increased with decreasing D although the value of the mean discharge current was kept constant. A simple analytical model is proposed to explain this effect. It is shown that the observed rise in with decreasing D is in major part caused by the rise in the ion current in the afterglow region of the pulsed discharge. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2012
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