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Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances

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    SYSNO ASEP0358498
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitlePhotodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances
    Author(s) Kochalska, Anna (UMCH-V)
    Nožár, Juraj (UMCH-V)
    Nešpůrek, Stanislav (UMCH-V) RID
    Peter, Jakub (UMCH-V) RID, ORCID
    Source TitleMacromolecular Symposia. - : Wiley - ISSN 1022-1360
    Roč. 295, č. 1 (2010), s. 71-76
    Number of pages6 s.
    ActionPrague Meetings on Macromolecules /73./ New Frontiers in Macromolecular Science: From Macromolecular Concepts of Living Matter to Polymers for Better Quality of Life
    Event date05.07.2009-09.07.2009
    VEvent locationPrague
    CountryCZ - Czech Republic
    Event typeWRD
    Languageeng - English
    CountryDE - Germany
    Keywordslithography ; photodegradation ; polymer
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsKAN400720701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    IAA100100622 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    OC 138 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    CEZAV0Z40500505 - UMCH-V (2005-2011)
    UT WOS000288038700008
    DOI10.1002/masy.200900075
    AnnotationEfficiency of the photodegradation of poly[methyl(phenyl)silylene] can be increased by electron acceptor additives with unstable anion radicals. The best chain degradation yield was obtained using benzoyl peroxide as an additive. The model for the photodegradation process is supported by quantum chemical calculations.
    WorkplaceInstitute of Macromolecular Chemistry
    ContactEva Čechová, cechova@imc.cas.cz ; Tel.: 296 809 358
    Year of Publishing2012
Number of the records: 1  

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