Number of the records: 1  

Properties of thiolate monolayers formed on different amalgam electrodes

  1. 1.
    SYSNO ASEP0358449
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleProperties of thiolate monolayers formed on different amalgam electrodes
    Author(s) Josypčuk, Bohdan (UFCH-W) RID, SAI, ORCID
    Mareček, Vladimír (UFCH-W) RID
    Source TitleJournal of Electroanalytical Chemistry. - : Elsevier - ISSN 1572-6657
    Roč. 653, 1-2 (2011), s. 7-13
    Number of pages7 s.
    Languageeng - English
    CountryCH - Switzerland
    Keywordsthiolate monolayer ; reductive desorption ; charge effect
    Subject RIVCG - Electrochemistry
    R&D ProjectsIAA400400806 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    GAP206/11/1638 GA ČR - Czech Science Foundation (CSF)
    LC06063 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    CEZAV0Z40400503 - UFCH-W (2005-2011)
    UT WOS000288722600002
    DOI10.1016/j.jelechem.2011.01.017
    AnnotationFormation and properties of thiol (HS(CH2)10COOH or HS(CH2)10CH3) monolayers were investigated at stationary electrodes based on silver, copper, bismuth and cadmium solid amalgams covered by a mercury meniscus or by a mercury film (m-AgSAE, MF-AgSAE, m-CuSAE, m-BiAgSAE and m-CdSAE). For comparison, parallel experiments were performed at a classical hanging mercury drop electrode (HMDE). Thiol monolayers were prepared at an optimal deposition potential (e.g., for HS(CH2)10COOH Eac = −350 mV for HMDE and silver amalgam electrodes, Eac = −750 to −800 mV for m-CuSAE and m-BiAgSAE, and Eac = −1050 mV for m-CdSAE) at which the formed layers exhibit high density and stability. It was found that the potential of a reductive desorption peak of a thiol monolayer strongly depends on the metal which forms the amalgam (for HS(CH2)10COOH: Ep = −864 to −859 mV for HMDE and silver amalgam electrodes, Em-BiAgSAE = −1079 mV, Em-CuSAE = −1136 mV and Em-CdSAE = −1248 mV).
    WorkplaceJ. Heyrovsky Institute of Physical Chemistry
    ContactMichaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196
    Year of Publishing2012
Number of the records: 1  

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