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Characterization and Properties of Titanium-Vanadium Oxide Thin Films Prepared by ArF Laser Ablation

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    SYSNO ASEP0357222
    Document TypeC - Proceedings Paper (int. conf.)
    R&D Document TypeConference Paper
    TitleCharacterization and Properties of Titanium-Vanadium Oxide Thin Films Prepared by ArF Laser Ablation
    Author(s) Fajgar, Radek (UCHP-M) RID, ORCID, SAI
    Kupčík, Jaroslav (UCHP-M) RID, ORCID, SAI
    Šubrt, Jan (UACH-T) SAI, RID
    Novotný, F. (CZ)
    Source TitleConference Proceedings. - Ostrava : TANGER, 2010 - ISBN 978-80-87294-19-2
    Pagess. 398-402
    Number of pages5 s.
    ActionNANOCON 2010. International Conference /2./
    Event date12.10.2010-14.10.2010
    VEvent locationOlomouc
    CountryCZ - Czech Republic
    Event typeEUR
    Languageeng - English
    CountryCZ - Czech Republic
    Keywordsvanadium-titanium ; thermochromic effect
    Subject RIVCF - Physical ; Theoretical Chemistry
    R&D ProjectsGA203/09/1117 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z40720504 - UCHP-M (2005-2011)
    AV0Z40320502 - UACH-T (2005-2011)
    UT WOS000286656400070
    AnnotationThin films od vanadium-titanium complex oxides were prepared by ArF excimer laser ablation of Tio2 and VO2 targets. The light grey films with thickness of 155 nm were grown on glass and Au substrates and characterized by microscopy, spectroscopy and diffraction techniques. The as-prepared films were nanocrystalline and heating at 450°C in vacuum led to formation of mixture of crystalline V0.95Ti0.05O and TiO nanoparticles. The film shown reversible thermochronic behaviour between 3.0 and 1.4 micrometers. The films, annealed in air oxidize and the colour of the film changes to light yellow. Electrical and optical properties of the films are demonstrated.
    WorkplaceInstitute of Chemical Process Fundamentals
    ContactEva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
    Year of Publishing2011
Number of the records: 1  

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