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Time-resolved investigation of dual high power impulse magnetronsputtering with closed magnetic field during deposition of Ti–Cu thin films
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SYSNO ASEP 0357100 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Time-resolved investigation of dual high power impulse magnetronsputtering with closed magnetic field during deposition of Ti–Cu thin films Author(s) Straňák, Vítězslav (FZU-D) RID, ORCID
Čada, Martin (FZU-D) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Tichý, M. (CZ)
Hippler, R. (DE)Source Title Journal of Applied Physics. - : AIP Publishing - ISSN 0021-8979
Roč. 108, č. 4 (2010), 043305/1-043305/8Number of pages 8 s. Language eng - English Country US - United States Keywords Langmuir probes ; magnetrons ; metallic thin films ; plasma density ; sputter deposition ; time resolved spectra Subject RIV BH - Optics, Masers, Lasers R&D Projects KJB100100805 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) 1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA202/09/0800 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000281857100027 DOI 10.1063/1.3467001 Annotation Time-resolved comparative study of dual magnetron sputtering (dual-MS) and dual high power impulse magnetron sputtering (dual-HiPIMS) systems arranged with closed magnetic field is presented. The dual-MS system was operated with a repetition frequency 4.65 kHz (duty cycle ≈ 50%). The frequency during dual-HiPIMS is lower as well as its duty cycle (f = 100 Hz, duty 1%). Different metallic targets (Ti, Cu) and different cathode voltages were applied to get required stoichiometry of Ti–Cu thin films. The plasma parameters of the interspace between magnetrons in the substrate position were investigated by time-resolved optical emission spectroscopy, Langmuir probe technique, and measurement of ion fluxes to the substrate. It is shown that plasma density as well as ion flux is higher about two orders of magnitude in dual-HiPIMS system. This fact is partially caused by low diffusion of ionized sputtered particles (Ti+,Cu+) which creates a preionized medium. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2011
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