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Plasma polymer films of tetravinylsilane modified by UV irradiation
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SYSNO ASEP 0355823 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Plasma polymer films of tetravinylsilane modified by UV irradiation Author(s) Čech, V. (CZ)
Lichovníková, S. (CZ)
Trivedi, R. (CZ)
Peřina, Vratislav (UJF-V) RID
Zemek, Josef (FZU-D) RID, ORCID
Mikulík, P. (CZ)
Caha, O. (CZ)Source Title Surface and Coatings Technology. - : Elsevier - ISSN 0257-8972
Roč. 205, Suppl. 1 (2010), S177-S181Number of pages 5 s. Action Asian-European International Conference on Plasma Surface Engineering/7./ - AEPSE 2009 Event date 20.09.2009-25.09.2009 VEvent location Busan Country KR - Korea, Republic of Event type WRD Language eng - English Country CH - Switzerland Keywords thin film ; PECVD ; tetravinylsilane ; UV irradiation Subject RIV BM - Solid Matter Physics ; Magnetism CEZ AV0Z10100521 - FZU-D (2005-2011) AV0Z10480505 - UJF-V (2005-2011) UT WOS 000286343200037 DOI 10.1016/j.surfcoat.2010.07.046 Annotation As deposited plasma polymer films of tetravinylsilane were modified by UV irradiation at ambient conditions. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2011
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