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New 3-dimensional nanostructured thin film silicon solar cells
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SYSNO ASEP 0355137 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title New 3-dimensional nanostructured thin film silicon solar cells Author(s) Vaněček, Milan (FZU-D) RID
Neykova, Neda (FZU-D) RID, ORCID
Babchenko, Oleg (FZU-D) RID, ORCID
Purkrt, Adam (FZU-D) RID
Poruba, Aleš (FZU-D) RID
Remeš, Zdeněk (FZU-D) RID, ORCID
Holovský, Jakub (FZU-D) RID, ORCID
Hruška, Karel (FZU-D) RID, ORCID
Meier, J. (CH)
Kroll, U. (CH)Number of authors 10 Source Title Proceedings of the 25th European Photovoltaic Solar Energy Conference / 5th World Conference on Photovoltaic Energy Conversion. - München : WIP-Renewable energies, 2010 - ISBN 3-936338-26-4 Pages s. 2763-2766 Number of pages 4 s. Action European Photovoltaic Solar Energy Conference /25./ and World Conference on Photovoltaic Energy Conversion /5./ Event date 06.09.2010-10.09.2010 VEvent location Valencia Country ES - Spain Event type WRD Language eng - English Country DE - Germany Keywords thin film solar cells, ; TCO transparent conductive oxides ; a-Si ; high stable efficiency, ; ZnO Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects 7E09057 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z10100521 - FZU-D (2005-2011) Annotation We present a “bottom up” approach for deposition of ZnO nanocolumns by direct low temperature hydrothermal synthesis and the results of complementary design with nano- or micro-holes etched into the ZnO (“Swiss cheese” design). Electron beam lithography was used for defining the openings in resist for selective ZnO nanocolumns growth in the first case, optical lithography and reactive ion etching have been used to fabricate the holes into ZnO substrate in the later case. Monte Carlo modeling of these new, 3D solar cells, using already existing materials is presented. Calculations show that stable efficiency of amorphous silicon p-i-n solar cells in over 12% range is possible and for the Micromorph cells efficiency can reach over 15%, with the layer thickness of amorphous Si below 200 nm and microcrystalline Si around 500 nm. The first “proof of concept” Micromorph cell with the “Swiss cheese” design is presented. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2011
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