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Communications: Evidence for the Role of Fluctuations in the Thermodynamics of Nanoscale Drops and the Implications in Computations of the Surface Tension

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    SYSNO ASEP0354874
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleCommunications: Evidence for the Role of Fluctuations in the Thermodynamics of Nanoscale Drops and the Implications in Computations of the Surface Tension
    Author(s) Sampayo, J.G. (GB)
    Malijevský, Alexandr (UCHP-M) RID, ORCID, SAI
    Müeller, E.A. (GB)
    de Miguel, E. (ES)
    Jackson, G. (GB)
    Source TitleJournal of Chemical Physics. - : AIP Publishing - ISSN 0021-9606
    Roč. 132, č. 14 (2010), , 141101 -1-4
    Number of pages4 s.
    Languageeng - English
    CountryUS - United States
    Keywordsdrops ; free energy ; molecular dynamics method
    Subject RIVCF - Physical ; Theoretical Chemistry
    R&D ProjectsIAA200760905 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    IAA400720710 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    CEZAV0Z40720504 - UCHP-M (2005-2011)
    UT WOS000276973500001
    DOI10.1063/1.3376612
    AnnotationTest-area deformations are used to analyze vapor-liquid interfaces of Lennard-Jones particles by molecular dynamics simulation. For planar vapor-liquid interfaces the change in free energy is captured by the average of the corresponding change in energy, the leading-order contribution. This is consistent with the commonly used mechanical pressure-tensor route for the surface tension. By contrast for liquid drops, one finds a large second-order contribution associated with fluctuations in energy. Both the first- and second-order terms make comparable contributions, invalidating the mechanical relation for the surface tension of small drops. The latter is seen to increase above the planar value for drop radii of 8 particle diameters, followed by an apparent weak maximum and slow decay to the planar limit, consistent with a small negative Tolman length.
    WorkplaceInstitute of Chemical Process Fundamentals
    ContactEva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
    Year of Publishing2011
Number of the records: 1  

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