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Effect of Hydrogen on the Properties of Amorphous Carbon Nitride Films
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SYSNO ASEP 0352948 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Effect of Hydrogen on the Properties of Amorphous Carbon Nitride Films Author(s) Mikmeková, Eliška (UPT-D) RID
Urbánek, Michal (UPT-D) RID
Fořt, Tomáš (UPT-D) RID, ORCID, SAI
Di Mundo, R. (IT)Number of authors 5 Source Title 2010 International Conference on Manufacturing Science and Technology (ICMST 2010). - Chengdu : Institute of Electrical and Electronics Engineers, Inc, 2010 - ISBN 978-1-4244-8759-2 Pages s. 291-295 Number of pages 5 s. Action International Conference on Manufacturing Science and Technology - ICMST 2010 Event date 26.11.2010-28.11.2010 VEvent location Kuala Lumpur Country MY - Malaysia Event type WRD Language eng - English Country CN - China Keywords hydrogenated alfa-CNx films ; ressidal stress ; r. f. magnetron sputtering ; SLEEM ; XPS ; TDMS ; AFM Subject RIV JI - Composite Materials CEZ AV0Z20650511 - UPT-D (2005-2011) UT WOS 000309016401232 Annotation rf - The effect of hydrogen on the properties of amorphous carbon nitride films deposited onto Si substrates by magnetron sputtering device has been studied. Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2011
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