Number of the records: 1  

Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser

  1. 1.
    SYSNO ASEP0352022
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleInteraction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser
    Author(s) Hau-Riege, S.P. (US)
    London, R.A. (US)
    Graf, A. (US)
    Baker, S. L. (US)
    Soufli, R. (US)
    Sobierajski, R. (PL)
    Burian, Tomáš (FZU-D) RID, ORCID
    Chalupský, Jaromír (FZU-D) RID, ORCID
    Juha, Libor (FZU-D) RID, ORCID, SAI
    Gaudin, J. (DE)
    Krzywinski, J. (US)
    Moeller, S. (US)
    Messerschmidt, M. (US)
    Bozek, J. (US)
    Bostedt, C. (US)
    Source TitleOptics Express. - : Optical Society of America - ISSN 1094-4087
    Roč. 18, č. 23 (2010), s. 23933-23938
    Number of pages8 s.
    Languageeng - English
    CountryUS - United States
    Keywordsx-ray optics ; optical materials ; x-ray free electron laser
    Subject RIVBH - Optics, Masers, Lasers
    R&D ProjectsKAN300100702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    IAAX00100903 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    ME10046 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    IAA400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    CEZAV0Z10100523 - FZU-D (2005-2011)
    UT WOS000283940900064
    DOI10.1364/OE.18.023933
    AnnotationMaterials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2011
Number of the records: 1  

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