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Study of Cu+, Ag+ and Au+ ion implantation into silicate glasses

SYSNO ASEP	0351912
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Study of Cu+, Ag+ and Au+ ion implantation into silicate glasses
Author(s)	Švecová, B. (CZ) Nekvindová, P. (CZ) Macková, Anna (UJF-V)_{RID, ORCID, SAI} Malinský, Petr (UJF-V)_{RID, ORCID, SAI} Kolitsch, A. (DE) Machovič, V. (CZ) Stara, S. (CZ) Míka, M. (CZ) Špirková, J. (CZ)
Number of authors	9
Source Title	Journal of Non-Crystalline Solids. - : Elsevier - ISSN 0022-3093 Roč. 356, 44-49 (2010), s. 2468-2472
Number of pages	5 s.
Action	XII International Conference on the Physics of Non-Crystalline Solids
Event date	06.09.-09.09.2009
VEvent location	Foz do Iguaçu, PR, Brazil
Country	BR - Brazil
Event type	WRD
Language	eng - English
Country	NL - Netherlands
Keywords	Ion implantation ; Silicate glasses ; Metal nanoparticles ; RBS
Subject RIV	BG - Nuclear, Atomic and Molecular Physics, Colliders
R&D Projects	LC06041 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	GA106/09/0125 GA ČR - Czech Science Foundation (CSF)
CEZ	AV0Z10480505 - UJF-V (2005-2011)
UT WOS	000285282100038
DOI	10.1016/j.jnoncrysol.2010.03.031
Annotation	A study of the ion implantation of Cu+, Ag+ or Au+ ions into different types of silicate glasses is reported. The energy of the implanted ions was 330 keV and the implantation fluence was kept at 11016 cm-2. The samples were characterised by various analytical methods: Rutherford Backscattering Spectrometry for the concentration depth profiles of the implanted atoms, Raman spectroscopy for the structure of the samples and also by UV-VIS absorption spectroscopy. The obtained data were evaluated on the bases of the structure of the glass matrix and the relations between the structural changes and optical properties, important for photonics applications, were formulated. The main focus was the impact of various types and concentrations of glass network modifiers (e.g. Li, Na, K, Mg, Ca or Zn) as well as glass network formers (Si, B) on the projected range of the implanted ions.
Workplace	Nuclear Physics Institute
Contact	Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228
Year of Publishing	2011

Number of the records: 1