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Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina

  1. 1.
    SYSNO ASEP0351378
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleGeneration of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina
    Author(s) Pokorný, Petr (FZU-D) RID, ORCID, SAI
    Bulíř, Jiří (FZU-D) RID, ORCID, SAI
    Lančok, Ján (FZU-D) RID, ORCID
    Musil, Jindřich (FZU-D) RID, ORCID
    Novotný, Michal (FZU-D) RID, ORCID, SAI
    Source TitlePlasma Processes and Polymers. - : Wiley - ISSN 1612-8850
    Roč. 7, č. 11 (2010), s. 910-914
    Number of pages5 s.
    Languageeng - English
    CountryDE - Germany
    Keywordsaluminium oxide ; ion-energy distribution function ; magnetron ; mass spectrometry ; pulsed discharges
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsIAA100100718 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    KAN400100653 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    GP202/09/P324 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z10100522 - FZU-D (2005-2011)
    UT WOS000285212000004
    DOI10.1002/ppap.201000064
    AnnotationThe paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate φO2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates φO2=φAr. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2011
Number of the records: 1  

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