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Determination of proximity effect forward scattering range parameter in e-beam lithography
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SYSNO ASEP 0350671 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Determination of proximity effect forward scattering range parameter in e-beam lithography Author(s) Urbánek, Michal (UPT-D) RID
Kolařík, Vladimír (UPT-D) RID, ORCID, SAI
Král, Stanislav (UPT-D) RID, SAI
Dvořáková, Marie (UPT-D)Number of authors 4 Source Title Proceedings of the 12th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. - Brno : Institute of Scientific Instruments AS CR, v.v.i, 2010 / Mika F. - ISBN 978-80-254-6842-5 Pages s. 67-68 Number of pages 2 s. Action International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /12./ Event date 31.05.2010-04.06.2010 VEvent location Skalský dvůr Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords electron beam lithography ; proximity effect Subject RIV JA - Electronics ; Optoelectronics, Electrical Engineering R&D Projects FR-TI1/576 GA MPO - Ministry of Industry and Trade (MPO) ED0017/01/01 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z20650511 - UPT-D (2005-2011) UT WOS 000290773700026 Annotation Electron beam lithography (EBL) is a tool for generation patterns with high resolution, so it is necesessary to control critical dimensions of created patterns, because the undesired influence of adjacent regions to those exposed can occur due to the proximity effect. Proximity effect is often described by two Gaussian function, where .alpha. represents forward scattering range parameter. Consequently, we present evaluation of proximity parameter .alpha. by various method in this paper. Workplace Institute of Scientific Instruments Contact Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Year of Publishing 2011
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