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A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength
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SYSNO ASEP 0350331 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength Author(s) Wachulak, P.W. (PL)
Bartnik, A. (PL)
Fiedorowicz, H. (PL)
Feigl, T. (DE)
Jarocki, R. (PL)
Kostecki, J. (PL)
Rudawski, P. (PL)
Sawicka, Magdalena (FZU-D) RID
Szczurek, M. (PL)
Szczurek, A. (PL)
Zawadzki, Z. (PL)Source Title Applied Physics B-Lasers and Optics. - : Springer - ISSN 0946-2171
Roč. 100, č. 3 (2010), 461-469Number of pages 9 s. Language eng - English Country DE - Germany Keywords laser-plasma ; EUV source ; gas puff target ; elliptical multi-layer ; mirror ; table-top setup Subject RIV BH - Optics, Masers, Lasers CEZ AV0Z10100523 - FZU-D (2005-2011) UT WOS 000280842400004 DOI 10.1007/s00340-010-4076-9 Annotation A compact, high-repetition table-top EUV source, based on a gas-puff target, is presented. This source was developed in our group and is capable of emitting quasimonochromatic radiation at 13.8 nm wavelength with the inverse relative bandwidth of 140 and pulse energies up to ~1.3 μJ/pulse at 10-Hz repetition rate. The source is debrisfree, operates near the lithographic wavelengths and offers the energy density of ~0.4 mJ/cm2 in each EUV pulse. These three features make the source attractive for lithographic experiments. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2011
Number of the records: 1