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Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses
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SYSNO ASEP 0350278 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses Author(s) Mocek, Tomáš (FZU-D) RID, ORCID, SAI
Jakubczak, Krzysztof (FZU-D)
Kozlová, Michaela (FZU-D) RID, ORCID
Polan, Jiří (FZU-D)
Homer, Pavel (FZU-D) RID
Hřebíček, J. (CZ)
Sawicka, Magdalena (FZU-D) RID
Kim, I. J. (KR)
Park, S.B. (KR)
Kim, C. M. (KR)
Lee, G.H. (KR)
Kim, T.K. (KR)
Nam, C. H. (KR)
Chalupský, Jaromír (FZU-D) RID, ORCID
Hájková, Věra (FZU-D) RID, ORCID
Juha, Libor (FZU-D) RID, ORCID, SAI
Sobota, Jaroslav (UPT-D) RID, ORCID, SAI
Fořt, Tomáš (UPT-D) RID, ORCID, SAI
Rus, Bedřich (FZU-D) ORCIDSource Title Radiation Effects and Defects in Solids. - : Taylor & Francis - ISSN 1042-0150
Roč. 165, 6-10 (2010), s. 551-558Number of pages 8 s. Language eng - English Country GB - United Kingdom Keywords XUV lasers ; ablation ; microstructuring ; laser-induced periodic surface structures Subject RIV BH - Optics, Masers, Lasers R&D Projects KAN300100702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GC202/07/J008 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100523 - FZU-D (2005-2011) AV0Z20650511 - UPT-D (2005-2011) UT WOS 000281854500021 DOI 10.1080/10420151003722867 Annotation We report on a single-shot micropatterning of an organic polymer achieved by ablation with demagnifying projection using a plasma-based extreme ultraviolet (XUV) laser at 21 nm. A nickel mesh with a period of 100μm was 10 × demagnified and imprinted on poly(methyl methacrylate) (PMMA) via direct ablation. This first demonstration of single-shot projection, single-step lithography illustrates the great potential of XUV lasers for the direct patterning of materials with a resolution scalable down to the submicrometer domain. In the second part, we present a novel experimental method for improving the efficiency of surface processing of various solids achieved by simultaneous action of XUV. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2011
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