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Double hollow cathode plasma jet-low temperature method for the TiO.sub.2-x./sub.N.sub.x./sub. photoresponding films
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SYSNO ASEP 0346487 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Double hollow cathode plasma jet-low temperature method for the TiO2-xNx photoresponding films Author(s) Kment, Štěpán (FZU-D) RID, ORCID
Klusoň, Petr (UCHP-M) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Krýsa, J. (CZ)
Čada, Martin (FZU-D) RID, ORCID, SAI
Gregora, Ivan (FZU-D) RID, ORCID
Deyneka, Alexander (FZU-D)
Remeš, Zdeněk (FZU-D) RID, ORCID
Žabová, Hana (UCHP-M)
Jastrabík, Lubomír (FZU-D) RID, ORCIDSource Title Electrochimica acta. - : Elsevier - ISSN 0013-4686
Roč. 55, č. 5 (2010), s. 1548-1556Number of pages 9 s. Language eng - English Country GB - United Kingdom Keywords TiO ; plasma jets Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KJB100100805 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KAN400720701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GA202/09/0800 GA ČR - Czech Science Foundation (CSF) KJB100100703 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z10100522 - FZU-D (2005-2011) AV0Z40720504 - UCHP-M (2005-2011) UT WOS 000275596900008 DOI 10.1016/j.electacta.2009.10.017 Annotation The low temperature double hollow cathode plasma jet method for producing photoresponding thin transparent layers of TiO2-xNx is reported. The RF power magnitude was identified as the parameter affecting substantially the photoinduced properties of the produced films. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2011
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