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Pulsed depositions vs. continuous growth: Monte Carlo study of submonolayer regime
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SYSNO ASEP 0343285 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title Pulsed depositions vs. continuous growth: Monte Carlo study of submonolayer regime Author(s) Mašín, Martin (FZU-D)
Kotrla, Miroslav (FZU-D) RID, ORCIDSource Title e-Journal of Surface Science and Nanotechnology - ISSN 1348-0391
Roč. 8, - (2010), s. 65-68Number of pages 4 s. Language eng - English Country JP - Japan Keywords models of non-equilibrium phenomena ; epitaxy ; pulsed laser deposition ; surface diffusion ; clusters ; Monte Carlo simulations ; solid-gas interfaces Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GA202/09/0775 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100520 - FZU-D (2005-2011) DOI 10.1380/ejssnt.2010.65 Annotation We present theoretical study comparing kinetics, and the time evolution of surface features for two modes of epitaxial growth - pulsed deposition with a given repetition rate (PLD mode), and continuous growth with a constant flux (MBE mode). Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2011
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