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Self-Assembly of Symmetric Diblock Copolymers in Planar Slits with and without Nanopatterns: Insight from Dissipative Particle Dynamics Simulations
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SYSNO ASEP 0339615 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Self-Assembly of Symmetric Diblock Copolymers in Planar Slits with and without Nanopatterns: Insight from Dissipative Particle Dynamics Simulations Author(s) Petrus, P. (CZ)
Lísal, Martin (UCHP-M) RID, ORCID, SAI
Brennan, J.K. (US)Source Title Langmuir. - : American Chemical Society - ISSN 0743-7463
Roč. 26, č. 5 (2010), s. 3695-3709Number of pages 15 s. Language eng - English Country US - United States Keywords diblock copolymer ; dissipative particle dynamics ; nanopatterned confinement Subject RIV CF - Physical ; Theoretical Chemistry R&D Projects GA203/08/0094 GA ČR - Czech Science Foundation (CSF) 1ET400720507 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KAN400720701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z40720504 - UCHP-M (2005-2011) UT WOS 000274636900107 DOI 10.1021/la903200j Annotation We present a dissipative particle dynamics simulation study on the formation of nanostructures of symmetric diblock copolymers confined between planar surfaces with and without nanopatterns. The nanopatterned surface is mimicked by alternating portions of the surface that interact differently with the diblock copolymers. The formation of the diblock-copolymer nanostructures confined between the planar surfaces is investigated and characterized by varying the separation width and the strength of the interaction between the surfaces and the diblock copolymers. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2010
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