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Simplified procedure for patterned growth of nanocrystalline diamond micro-structures
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SYSNO ASEP 0337500 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Simplified procedure for patterned growth of nanocrystalline diamond micro-structures Author(s) Kromka, Alexander (FZU-D) RID, ORCID, SAI
Babchenko, Oleg (FZU-D) RID, ORCID
Rezek, Bohuslav (FZU-D) RID, ORCID
Ledinský, Martin (FZU-D) RID, ORCID, SAI
Hruška, Karel (FZU-D) RID, ORCID
Potměšil, Jiří (FZU-D)
Vaněček, Milan (FZU-D) RIDSource Title Thin Solid Films. - : Elsevier - ISSN 0040-6090
Roč. 518, č. 1 (2009), s. 343-347Number of pages 7 s. Language eng - English Country CH - Switzerland Keywords atomic force microscopy ; Raman spectroscopy ; nanocrystalline diamond ; selective diamond growth ; seed layer ; patterning Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects KAN400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KAN400100652 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) IAAX00100902 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z1010921 - FZU-D UT WOS 000270628800059 DOI 10.1016/j.tsf.2009.06.014 Annotation Two technological strategies to generate patterned diamond growth have been tested. The diamond microstructures (i.e. linear stripes and 5 μm narrow channels) were grown in the thickness of 450 nm on Si/SiO2 substrates by a microwave plasma chemical vapor deposition process. The observed results appear promising for the development of directly grown diamond-based transistors. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
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