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Etching enhanced annealing of GaMnAs layers
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SYSNO ASEP 0337274 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Etching enhanced annealing of GaMnAs layers Title Zvýšení účinnosti žíhaní GaMnAs pomocí leptání Author(s) Olejník, Kamil (FZU-D) RID, ORCID
Novák, Vít (FZU-D) RID, ORCID
Cukr, Miroslav (FZU-D)
Mašek, Jan (FZU-D) RID
Jungwirth, Tomáš (FZU-D) RID, ORCIDNumber of authors 5 Source Title Journal of Crystal Growth. - : Elsevier - ISSN 0022-0248
Roč. 311, č. 7 (2009), s. 2151-2154Number of pages 4 s. Language eng - English Country NL - Netherlands Keywords surface processes ; molecular beam epitaxy ; magnetic materials Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) KAN400100652 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GEFON/06/E001 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100521 - FZU-D (2005-2011) UT WOS 000265659300127 DOI 10.1016/j.jcrysgro.2008.10.051 Annotation We have studied the annealing process of GaMnAs enhanced by etching off the surfaře oxide layer. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
Number of the records: 1