Number of the records: 1  

Etching enhanced annealing of GaMnAs layers

  1. 1.
    SYSNO ASEP0337274
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleEtching enhanced annealing of GaMnAs layers
    TitleZvýšení účinnosti žíhaní GaMnAs pomocí leptání
    Author(s) Olejník, Kamil (FZU-D) RID, ORCID
    Novák, Vít (FZU-D) RID, ORCID
    Cukr, Miroslav (FZU-D)
    Mašek, Jan (FZU-D) RID
    Jungwirth, Tomáš (FZU-D) RID, ORCID
    Number of authors5
    Source TitleJournal of Crystal Growth. - : Elsevier - ISSN 0022-0248
    Roč. 311, č. 7 (2009), s. 2151-2154
    Number of pages4 s.
    Languageeng - English
    CountryNL - Netherlands
    Keywordssurface processes ; molecular beam epitaxy ; magnetic materials
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsLC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    KAN400100652 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    GEFON/06/E001 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z10100521 - FZU-D (2005-2011)
    UT WOS000265659300127
    DOI10.1016/j.jcrysgro.2008.10.051
    AnnotationWe have studied the annealing process of GaMnAs enhanced by etching off the surfaře oxide layer.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2010
Number of the records: 1  

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