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Titania seed layers for PZT thin film growth on copper-coated Kapton films
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SYSNO ASEP 0336552 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Titania seed layers for PZT thin film growth on copper-coated Kapton films Title Zárodečné mezivrstvy oxidu titanu určené pro růst PZT vrstev na poměděných kaptonových foliích Author(s) Suchaneck, G. (DE)
Volkonskiy, O. (DE)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Dejneka, Alexandr (FZU-D) RID, ORCID
Jastrabík, Lubomír (FZU-D) RID, ORCID
Adolphi, B. (DE)
Bertram, M. (DE)
Gerlach, G. (DE)Number of authors 8 Source Title Integrated Ferroelectrics - ISSN 1058-4587
Roč. 108, č. 1 (2009), s. 57-66Number of pages 10 s. Language eng - English Country GB - United Kingdom Keywords copper coated Kapton ; seed layer ; seed layer ; plasma deposition ; XPS Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GC202/09/J017 GA ČR - Czech Science Foundation (CSF) KJB100100703 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000271511000007 DOI 10.1080/10584580903324097 Annotation n this work, we investigate the deposition of crystallization-promoting amorphous titania seed layers onto Cu-coated Kapton (R) HN foils for a subsequent PZT thin film fabrication thereon. Ultrathin TiO2-x layers with controlled stoichiometry were deposited by reactive sputtering at low substrate temperatures. X-ray photoelectron spectroscopy revealed that the Ti4+ ion in the seed layer was stable against Ar+ bombardment-induced reduction while CuO was reduced to Cu2O. Adsorbed moisture, organic solvents and carbon contaminations were quickly removed by Ar+ ion bombardment. (111)-textured PZT was fabricated on seed-layer-coated flexible substrates by means of a RF-modulated plasma jet system. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
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