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Optical emission spectroscopy of various materials irradiated by soft x-ray free-electron laser
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SYSNO ASEP 0336007 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Optical emission spectroscopy of various materials irradiated by soft x-ray free-electron laser Title Optická emisní spektroskopie různých materiálů ozářených rentgenovým laserem s volnými elektrony Author(s) Cihelka, Jaroslav (FZU-D)
Juha, Libor (FZU-D) RID, ORCID, SAI
Chalupský, Jaromír (FZU-D) RID, ORCID
Rosmej, F.B. (FR)
Renner, Oldřich (FZU-D) RID, ORCID
Saksl, K. (SK)
Hájková, Věra (FZU-D) RID, ORCID
Vyšín, Luděk (FZU-D) RID, ORCID
Galtier, E. (FR)
Schott, R. (FR)
Khorsand, A.R. (NL)
Riley, D. (GB)
Dzelzainis, T. (GB)
Nelson, A. (US)
Lee, R. W. (US)
Heimann, P. (US)
Nagler, B. (GB)
Vinko, S. (GB)
Wark, J. (GB)
Whitcher, T. (GB)
Toleikis, S. (DE)
Tschentscher, T. (DE)
Fäustlin, R. (DE)
Wabnitz, H. (DE)
Bajt, S. (DE)
Chapman, H. (DE)
Krzywinski, J. (US)
Sobierajski, R. (PL)
Klinger, D. (PL)
Jurek, M. (PL)
Pelka, J. (PL)
Hau-Riege, S. (US)
London, R.A. (US)
Kuba, J. (CZ)
Stojanovic, N. (DE)
Sokolowski-Tinten, K. (DE)
Gleeson, A.J. (GB)
Störmer, M. (DE)
Andreasson, J. (SE)
Hajdu, J. (SE)
Timneanu, N. (SE)Source Title Damage to VUV, EUV, and X-ray Optics II. - Bellingham : SPIE, 2009 / Juha L. ; Bajt S. ; Sobierajski R. - ISSN 0277-786x - ISBN 9780819476357 Pages 73610p/1-73610p/10 Number of pages 10 s. Action Damage to VUV, EUV, and X-Ray Optics II Event date 21.04.2009-23.04.2009 VEvent location Prague Country CZ - Czech Republic Event type WRD Language eng - English Country US - United States Keywords optical emission spectroscopy ; free-electron laser ; atomic lines ; plasma plume ; warm dense matter Subject RIV BH - Optics, Masers, Lasers R&D Projects KAN300100702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) IAA400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z10100523 - FZU-D (2005-2011) Annotation The beam of Free-Electron Laser in Hamburg (FLASH) tuned at either 32.5 nm or 13.7 nm was focused by a grazing incidence elliptical mirror and an off-axis parabolic mirror coated by Si/Mo multilayer on 20-micron and 1-micron spot, respectively. The grazing incidence and normal incidence focusing of ~10-fs pulses carrying an energy of 10 μJ lead at the surface of various solids (Si, Al, Ti, Ta, Si3N4, BN, a-C/Si, Ni/Si, Cr/Si, Rh/Si, Ce:YAG, poly(methyl methacrylate) - PMMA, stainless steel, etc.) to an irradiance of 1013 W/cm2 and 1016 W/cm2, resp. The optical emission of the plasmas produced under these conditions was registered. Surprisingly, only lines belonging to the neutral atoms were observed at intensities around 1013 W/cm2 and 1016 W/cm2, resp. No lines of atomic ions have been identified in UV-vis spectra emitted from the plasmas formed by the FLASH beam focused in a 20-micron spot. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
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