Sub-micron focusing of soft x-ray free electron laser beam

Bajt, S.; Chapman, H.N.; Nelson, A.J.; Lee, R. W.; Toleikis, S.; Mirkarimi, P.; Alameda, J.B.; Baker, S. L.; Vollmer, H.; Graff, R.T.; Aquila, A.; Gullikson, E.M.; Meyer Ilse, J.; Spiller, E.A.; Krzywinski, J.; Juha, Libor; Chalupský, Jaromír; Hájková, Věra; Hajdu, J.; Tschentscher, T.

Number of the records: 1

Sub-micron focusing of soft x-ray free electron laser beam

1.

SYSNO ASEP	0336002
Document Type	C - Proceedings Paper (int. conf.)
R&D Document Type	Conference Paper
Title	Sub-micron focusing of soft x-ray free electron laser beam
Title	Mikrofokusace svazku měkkého rentgenového laseru s volnými elektrony
Author(s)	Bajt, S. (DE) Chapman, H.N. (DE) Nelson, A.J. (US) Lee, R. W. (US) Toleikis, S. (DE) Mirkarimi, P. (US) Alameda, J.B. (US) Baker, S. L. (US) Vollmer, H. (US) Graff, R.T. (US) Aquila, A. (US) Gullikson, E.M. (US) Meyer Ilse, J. (US) Spiller, E.A. (US) Krzywinski, J. (US) Juha, Libor (FZU-D)_{RID, ORCID, SAI} Chalupský, Jaromír (FZU-D)_{RID, ORCID} Hájková, Věra (FZU-D)_{RID, ORCID} Hajdu, J. (SE) Tschentscher, T. (DE)
Source Title	Damage to VUV, EUV, and X-ray Optics II. - Bellingham : SPIE, 2009 / Juha L. ; Bajt S. ; Sobierajski R. - ISSN 0277-786x - ISBN 9780819476357
Pages	73610j/1-73610j/10
Number of pages	10 s.
Action	Damage to VUV, EUV, and X-Ray Optics II
Event date	21.04.2009-23.04.2009
VEvent location	Prague
Country	CZ - Czech Republic
Event type	WRD
Language	eng - English
Country	US - United States
Keywords	microfocuses ; multilayer mirror ; free electron laser beam
Subject RIV	BH - Optics, Masers, Lasers
R&D Projects	KAN300100702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	IAA400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
CEZ	AV0Z10100523 - FZU-D (2005-2011)
Annotation	A multilayer-coated 27-cm focal length parabola, optimized to reflect 13.5 nm wavelength at normal incidence, was used in multiple FLASH experiments and focused the beam to a sub-micron beam size. The intensity of the beam was measured indirectly from the depths of craters left by the FLASH beam on PMMA-coated substrates. Comparing simulated and experimental shapes of the craters we found the best match for a wavefront error of 0.45 nm, or λ/30. We further estimated that the FWHM of the focal spot was 350 nm and that the intensity in the focus was 1018 W/cm2. The sub-micron FLASH beam provided extreme intensity conditions essential for warm dense matter experiments. The same optic was used in multiple experiments and survived the beam. However, after the first measurements, which took place over several days, the optical surface was contaminated. This contamination reduced the mirror reflectivity, which was partially recovered by oxygen plasma cleaning.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2010

Number of the records: 1