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Characterization of the focused beam from a 10-Hz desktop capillary-discharge 46.9-nm laser
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SYSNO ASEP 0335795 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Characterization of the focused beam from a 10-Hz desktop capillary-discharge 46.9-nm laser Title Charakterizace fokusovaného 46,9 nm svazku 10 Hz stolního kapilárního laseru Author(s) Vyšín, Luděk (FZU-D) RID, ORCID
Burian, T. (CZ)
Chalupský, Jaromír (FZU-D) RID, ORCID
Grisham, M. (US)
Hájková, Věra (FZU-D) RID, ORCID
Heinbuch, S. (US)
Jakubczak, Krzysztof (FZU-D)
Martz, D. (US)
Mocek, Tomáš (FZU-D) RID, ORCID, SAI
Pira, P. (CZ)
Polan, Jiří (FZU-D)
Rocca, J.J. (US)
Rus, Bedřich (FZU-D) ORCID
Sobota, Jaroslav (UPT-D) RID, ORCID, SAI
Juha, Libor (FZU-D) RID, ORCID, SAISource Title Damage to VUV, EUV, and X-ray Optics II. - Bellingham : SPIE, 2009 / Juha L. ; Bajt S. ; Sobierajski R. - ISSN 0277-786x - ISBN 9780819476357 Pages 73610o/1-73610o/8 Number of pages 8 s. Action Damage to VUV, EUV, and X-Ray Optics II Event date 21.04.2009-23.04.2009 VEvent location Prague Country CZ - Czech Republic Event type WRD Language eng - English Country US - United States Keywords XUV laser ; capillary-discharge laser ; annular intensity distribution ; beam imprint ; photo-induced erosion Subject RIV BH - Optics, Masers, Lasers R&D Projects KAN300100702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) IAAX00100903 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GA203/06/1278 GA ČR - Czech Science Foundation (CSF) IAA400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z10100523 - FZU-D (2005-2011) AV0Z20650511 - UPT-D (2005-2011) Annotation The desktop size capillary-discharge Ne-like Ar laser (CDL) providing 10-μJ nanosecond pulses of coherent 46.9-nm radiation with a repetition rate up to 12 Hz was developed and built at the Colorado State University in Fort Collins and then installed in Prague. The beam of the laser was focused by a spherical mirror covered with Si/Sc multilayer coating onto the surface of poly(methyl methacrylate) - PMMA. Interaction parameters vary by changing the distance between sample surface and beam focus. The samples were exposed to various numbers of shots. Analysis of damaged PMMA by atomic force (AFM) and Nomarski (DIC – differential interference contrast) microscopes allows not only to determine the key characteristics of the focused beam (e.g. Rayleigh’s parameter, focal spot diameter, tight focus position, etc.) but also to investigate mechanisms of the radiation-induced erosion processes. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
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