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Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems

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    SYSNO ASEP0335019
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleComparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems
    TitlePorovnávací studie celkové výkonové hustoty na substrát v pulzním DC magnetronovém výboji a v plazma-jetu s dutou katodou
    Author(s) Čada, Martin (FZU-D) RID, ORCID, SAI
    Virostko, Petr (FZU-D)
    Kment, Štěpán (FZU-D) RID, ORCID
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Source TitlePlasma Processes and Polymers. - : Wiley - ISSN 1612-8850
    Roč. 6, S1 (2009), S247-S252
    Number of pages6 s.
    ActionInternational Conference on Plasma Surface Engineering /11./
    Event date15.09.2008-19.09.2008
    VEvent locationGarmisch Partenkirchen
    CountryDE - Germany
    Event typeWRD
    Languageeng - English
    CountryDE - Germany
    Keywordscalorimeter probe ; floating substrate ; magnetron ; plasma jet ; pulsed discharge
    Subject RIVBH - Optics, Masers, Lasers
    R&D ProjectsKAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    KJB100100707 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    KJB100100805 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    CEZAV0Z10100522 - FZU-D (2005-2011)
    UT WOS000272302900050
    DOI10.1002/ppap.200930611
    AnnotationThe pulsed DC magnetron and hollow-cathode plasma jet sources have been studied from the point of view of total energy flux density at a ‘‘floating’’ substrate. Both plasma sources were operated under identical experimental conditions and differences between both systems were investigated. The aim of this work is focused on the characterization of total power density at electrically isolated substrate for various duty cycles and for different pulsing frequencies. A calorimeter probe with incorporated thermocouple junction was used for measurement of the total power density on the substrate. The main results from the calorimeter probe show clearly that total power density at the substrate is much higher for the planar magnetron operating at low duty cycle and high pulsing frequency than for the plasma jet. The total power density measured in the planar magnetron depends more strongly on the duty cycle and the pulsing frequency than measured in the plasma jet.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2010
Number of the records: 1  

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