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Physical properties of homogeneous TiO.sub.2./sub. films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure
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SYSNO ASEP 0334335 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure Title Fyzikální vlastnosti homogenních TiO2 vrstev připravovaných pomocí vysokovýkonového pulzního magnetronového odprašování v závislosti na krystalografické fázi a nanostruktuře Author(s) Straňák, Vítězslav (FZU-D) RID, ORCID
Čada, Martin (FZU-D) RID, ORCID, SAI
Quaas, M. (DE)
Block, S. (DE)
Bogdanowicz, R. (PL)
Kment, Štěpán (FZU-D) RID, ORCID
Wulff, H. (DE)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Helm, Ch.A. (DE)
Tichý, M. (CZ)
Hippler, R. (DE)Number of authors 11 Source Title Journal of Physics D-Applied Physics. - : Institute of Physics Publishing - ISSN 0022-3727
Roč. 42, č. 10 (2009), 105204/1-105204/12Number of pages 12 s. Language eng - English Country GB - United Kingdom Keywords TiO2 ; high power magnteron sputtering ; plasma diagnostic ; film diagnostic Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KJB100100805 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KAN400720701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000265677400036 DOI 10.1088/0022-3727/42/10/105204 Annotation Optical, photo-electrochemical, crystallographic and morphological properties of TiO2 thin films prepared by high power impulse magnetron sputtering at low substrate temperatures (<65 ◦C) without post-deposition thermal annealing are studied. The different crystallographic phases were determined with grazing incidence x-ray diffractometry. The surface morphology and size of TiO2 grains/clusters were imaged with atomic force microscopy. Basic plasma parameters were determined by means of the time-resolved Langmuir probe technique. The power density influx on the substrate was estimated from calorimetric probe measurement. The data from calorimetric probe measurements and time-resolved Langmuir probe served as input parameters for the calculation of influx contributions of particular species. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
Number of the records: 1