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Measurement of total energy flux density at a substrate during TiO.sub.x./sub. thin film deposition by using a plasma jet system
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SYSNO ASEP 0334316 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system Author(s) Čada, Martin (FZU-D) RID, ORCID, SAI
Virostko, Petr (FZU-D)
Kment, Štěpán (FZU-D) RID, ORCID
Hubička, Zdeněk (FZU-D) RID, ORCID, SAINumber of authors 4 Source Title Vacuum. - : Elsevier - ISSN 0042-207X
Roč. 83, č. 4 (2009), s. 738-744Number of pages 7 s. Language eng - English Country GB - United Kingdom Keywords hollow cathode ; plasma jet ; sputtering ; pulsed DC ; energy influx on substrate ; TiO2 Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects KJB100100707 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000261824400008 DOI 10.1016/j.vacuum.2008.05.014 Annotation The total energy flux density delivered to an electrically isolated substrate in a low-pressure pulsed DC hollow cathode plasma jet sputtering system during TiO2 thin film deposition has been quantified. The plasma source was operated in constant average current mode and in a mixture of argon and oxygen or only in pure argon working gas. A titanium nozzle served as the hollow cathode. The total energy flux density measurements were made using a planar calorimeter probe. The main results from the calorimeter probe showed clearly that the total energy flux density at the electrically isolated substrate decreases significantly with duty cycle from 100% (DC mode) to 10% at a given pulsing frequency 2.5 kHz. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
Number of the records: 1