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Radiation damage to amorphous carbon thin films irradiated by multiple 46.9 nm laser shots below the single-shot damage threshold

SYSNO ASEP	0334101
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Radiation damage to amorphous carbon thin films irradiated by multiple 46.9 nm laser shots below the single-shot damage threshold
Title	Radiační poškození tenkých vrstev amorfního uhlíku ozářených několika 46.9-nm laserovými pulzy pod prahem poškození jedním impulzem
Author(s)	Juha, Libor (FZU-D)_{RID, ORCID, SAI} Hájková, Věra (FZU-D)_{RID, ORCID} Chalupský, Jaromír (FZU-D)_{RID, ORCID} Vorlíček, Vladimír (FZU-D)_RID Ritucci, A. (IT) Reale, A. (IT) Zuppella, P. (IT) Störmer, M. (DE)
Source Title	Journal of Applied Physics. - : AIP Publishing - ISSN 0021-8979 Roč. 105, č. 9 (2009), 093117/1-093117/3
Number of pages	6 s.
Language	eng - English
Country	US - United States
Keywords	single-shot damage threshold ; multiple-shot exposure damage ; amorphous carbon ; radiation erosion ; capillary-discharge XUV laser
Subject RIV	BH - Optics, Masers, Lasers
R&D Projects	KAN300100702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	IAA400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
CEZ	AV0Z10100523 - FZU-D (2005-2011)
UT WOS	000266263300018
DOI	10.1063/1.3117515
Annotation	High-surface-quality amorphous carbon (a-C) optical coatings with a thickness of 45 nm, deposited by magnetron sputtering on a silicon substrate, were irradiated by the 46.9 nm focused beam of capillary-discharge Ne-like Ar extreme ultraviolet laser. It has been found that an accumulation of 10, 20, and 40 shots at a fluence of 0.5 J/cm(2), i.e., below the single-shot damage threshold, causes irreversible changes of thin a-C layers, which can be registered by both the AFM and the DIC microscopy. In the center of the damaged area, AFM shows a-C removal to a maximum depth of 0.3, 1.2, and 1.5 nm for 10-, 20-and 40-shot exposure, respectively.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2010

Number of the records: 1