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Damage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle

  1. 1.
    SYSNO ASEP0334026
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleDamage of amorphous carbon induced by soft x-ray femtosecond pulses above and below the critical angle
    TitleStudium poškozování amorfního uhlíku ozařovaného femtosekundovými pulsy měkkého rentgenového záření nad a pod kritickým úhlem
    Author(s) Chalupský, Jaromír (FZU-D) RID, ORCID
    Hájková, Věra (FZU-D) RID, ORCID
    Altapova, V. (DE)
    Burian, T. (CZ)
    Gleeson, A.J. (GB)
    Juha, Libor (FZU-D) RID, ORCID, SAI
    Jurek, M. (PL)
    Sinn, H. (DE)
    Störmer, M. (DE)
    Sobierajski, R. (PL)
    Tiedtke, K. (DE)
    Toleikis, S. (DE)
    Tschentscher, T. (DE)
    Vyšín, Luděk (FZU-D) RID, ORCID
    Wabnitz, H. (DE)
    Gaudin, J. (DE)
    Source TitleApplied Physics Letters. - : AIP Publishing - ISSN 0003-6951
    Roč. 95, č. 3 (2009), 031111/1-031111/3
    Number of pages3 s.
    Languageeng - English
    CountryUS - United States
    Keywordsamorphous state ; carbon ; coatings ; graphitisation ; laser beam effects ; nanostructured materials ; phase transformations ; reflectivity
    Subject RIVBH - Optics, Masers, Lasers
    R&D ProjectsKAN300100702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    IAAX00100903 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    IAA400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    CEZAV0Z10100523 - FZU-D (2005-2011)
    UT WOS000268405300011
    DOI10.1063/1.3184785
    AnnotationWe present results of damage studies conducted at the Free Electron LASer in Hamburg (FLASH) facility with 13.5 nm (91.8 eV) and 7 nm (177.1 eV) radiations. The laser beam was focused on a sample of 890-nm-thick amorphous carbon coated on a silicon wafer mimicking a x-ray mirror. The fluence threshold for graphitization was determined for different grazing angles above and below the critical angle. The observed angular dependence of F-th is explained by the variation in absorption depth and reflectivity. Moreover, the absorbed local dose needed for the phase transition leading to graphitization is shown to vary with the radiation wavelength.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2010
Number of the records: 1  

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