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Fe and Fe+2%Si targets as ion sources via UV laser ablation plasma
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SYSNO ASEP 0333736 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Fe and Fe+2%Si targets as ion sources via UV laser ablation plasma Title Ablace Fe a Fe +2% Si terčíků pomocí UV laseru plazmovým zdrojem iontů Author(s) Lorusso, A. (IT)
Krása, Josef (FZU-D) RID, ORCID
Láska, Leoš (FZU-D)
Nassisi, V. (IT)
Velardi, L. (IT)Source Title European Physical Journal D. - : Springer - ISSN 1434-6060
Roč. 54, č. 2 (2009), 473-476Number of pages 4 s. Language eng - English Country DE - Germany Keywords metallic alloy laser-produced plasma ; enhanced ion emission ; ion temperature Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects IAA100100715 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z10100523 - FZU-D (2005-2011) UT WOS 000268329200048 DOI 10.1140/epjd/e2009-00023-y Annotation Characteristics of Fe and Fe with 2% of Si free expanding plasmas produced with the use of KrF laser beam of 10^8 W/cm2 irradiance were determined. The analysis of time-resolved ion currents showed that the Si admixture enhances both the ion charge yield and the plasma temperature, which corresponds in turn to the increasing of the average kinetic energy of the particles as well as of the more collimated space distribution of ions. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
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