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A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet
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SYSNO ASEP 0333649 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title A study of the ion flux during deposition of titanium thin films by hollow cathode plasma jet Title Studium iontového toku během depozice tenkých vrstev titanu pomocí plazmové trysky s efektem duté katody Author(s) Virostko, Petr (FZU-D)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Čada, Martin (FZU-D) RID, ORCID, SAI
Kment, Štěpán (FZU-D) RID, ORCID
Jastrabík, Lubomír (FZU-D) RID, ORCID
Tichý, M. (CZ)Source Title Journal of Plasma and Fusion Research SERIES - ISSN 1883-9630
Roč. 8, - (2009), 719-723Number of pages 5 s. Action Proceedings of the 14th International Congress on Plasma Physics (ICPP2008) Event date 08.09.2008-12.09.2008 VEvent location Fukuoka Country JP - Japan Event type WRD Language eng - English Country JP - Japan Keywords ion flux ; plasma jet ; hollow cathode ; plasma diagnostics Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects KJB100100707 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) KJB100100805 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) 1M06002 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z10100522 - FZU-D (2005-2011) Annotation Flux of positive ions to the substrate in the hollow cathode plasma jet system during deposition of titanium thin films was studied. The substrate was negatively biased by applying 50 kHz pulsed DC, or 0.50-1.25 MHz and 13.56 MHz high-frequency voltage to it. The ion flux determined in the DC hollow cathode discharge during the active high frequency bias was systematically higher than for the pulsed DC bias or determined right after the high frequency bias was turned off. On the other hand in the RF hollow cathode discharge, the ion fluxes determined for the active high frequency and 50 kHz low frequency bias were comparable. Possible explanations of this phenomenon are discussed. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
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