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Deposition of Germanium Nanowires from Digermane Precursor: Influence of the Substrate Pretreatment

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    SYSNO ASEP0330687
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JOstatní články
    TitleDeposition of Germanium Nanowires from Digermane Precursor: Influence of the Substrate Pretreatment
    TitleDepozice germaniových nanodrátů z digermánu: Vliv úpravy substrátu
    Author(s) Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
    Fajgar, Radek (UCHP-M) RID, ORCID, SAI
    Klementová, Mariana (UACH-T) RID, SAI, ORCID
    Šubrt, Jan (UACH-T) SAI, RID
    Source TitleECS Transactions. - : Institute of Physics Publishing - ISSN 1938-5862
    Roč. 25, č. 8 (2009), s. 1015-1022
    Number of pages8 s.
    Languageeng - English
    CountryUS - United States
    Keywordsmicroelectronic circuits ; nanoscale technology
    Subject RIVCH - Nuclear ; Quantum Chemistry
    R&D ProjectsGA203/09/1088 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z40720504 - UCHP-M (2005-2011)
    AV0Z40320502 - UACH-T (2005-2011)
    AnnotationGermanium Nanowires (GeNWs) were synthesized by Low Pressure Chemical Vapor Deposition (LPCVD) of hexamethyldigermane (GeMe3)2 at temperature of 490 {degree sign}C and pressure of 90-100 Pa. GeNWs of several nanometers in diameter and a few microns in length were deposited onto various substrates - stainless steel, Fe, Mo, Ta, W, Si, and SiO2. Influence of surface pretreatment of the substrates (roughening of surface or Ge sputtering) is discussed in respect to the previously published theory of GeNW growth through the intermetallic alloy mechanism. The results conclude that another mechanism should be taken into account - the non-catalyst mechanism. Ge seeds necessary for triggering GeNW growth are formed by aggregation of Ge atoms/atom clusters/fragments which are stuck onto the substrate surface at the beginning of the process. The non-catalyst growth of GeNW triggered by such mechanism can be applied in growing GeNWs on semiconductors and insulators.
    WorkplaceInstitute of Chemical Process Fundamentals
    ContactEva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
    Year of Publishing2010
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