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Deposition of Germanium Nanowires from Digermane Precursor: Influence of the Substrate Pretreatment
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SYSNO ASEP 0330687 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Ostatní články Title Deposition of Germanium Nanowires from Digermane Precursor: Influence of the Substrate Pretreatment Title Depozice germaniových nanodrátů z digermánu: Vliv úpravy substrátu Author(s) Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Klementová, Mariana (UACH-T) RID, SAI, ORCID
Šubrt, Jan (UACH-T) SAI, RIDSource Title ECS Transactions. - : Institute of Physics Publishing - ISSN 1938-5862
Roč. 25, č. 8 (2009), s. 1015-1022Number of pages 8 s. Language eng - English Country US - United States Keywords microelectronic circuits ; nanoscale technology Subject RIV CH - Nuclear ; Quantum Chemistry R&D Projects GA203/09/1088 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z40720504 - UCHP-M (2005-2011) AV0Z40320502 - UACH-T (2005-2011) Annotation Germanium Nanowires (GeNWs) were synthesized by Low Pressure Chemical Vapor Deposition (LPCVD) of hexamethyldigermane (GeMe3)2 at temperature of 490 {degree sign}C and pressure of 90-100 Pa. GeNWs of several nanometers in diameter and a few microns in length were deposited onto various substrates - stainless steel, Fe, Mo, Ta, W, Si, and SiO2. Influence of surface pretreatment of the substrates (roughening of surface or Ge sputtering) is discussed in respect to the previously published theory of GeNW growth through the intermetallic alloy mechanism. The results conclude that another mechanism should be taken into account - the non-catalyst mechanism. Ge seeds necessary for triggering GeNW growth are formed by aggregation of Ge atoms/atom clusters/fragments which are stuck onto the substrate surface at the beginning of the process. The non-catalyst growth of GeNW triggered by such mechanism can be applied in growing GeNWs on semiconductors and insulators. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2010
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