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Determination of electron inelastic mean free paths for poly[methyl(phenyl)silylene] films

  1. 1.
    SYSNO ASEP0328517
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleDetermination of electron inelastic mean free paths for poly[methyl(phenyl)silylene] films
    TitleStanovení středních neelastických volných drah elektronů v tenkých vrstvách polymetylfenyl silylenu
    Author(s) Zemek, Josef (FZU-D) RID, ORCID
    Houdková, Jana (FZU-D) RID, ORCID
    Jiříček, Petr (FZU-D) RID, ORCID, SAI
    Jablonski, A. (PL)
    Jurka, Vlastimil (FZU-D) RID, ORCID
    Kub, Jiří (FZU-D) RID, ORCID
    Number of authors6
    Source TitlePolymer. - : Elsevier - ISSN 0032-3861
    Roč. 50, č. 11 (2009), s. 2445-2450
    Number of pages6 s.
    Languageeng - English
    CountryGB - United Kingdom
    Keywordspolymer physics ; poly[methyl(phenyl)silylene] ; inelastic mean free path
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsGA202/09/0428 GA ČR - Czech Science Foundation (CSF)
    IAA100100622 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    CEZAV0Z10100521 - FZU-D (2005-2011)
    UT WOS000266319100013
    DOI10.1016/j.polymer.2009.03.031
    AnnotationThe IMFP of electrons at a poly[methyl(phenyl)silylene] film surface were determined using elastic peak electron spectroscopy and Monte Carlo calculations.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2010
Number of the records: 1  

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