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Modelling of capillary Z-pinch recombination pumping of boron extreme ultraviolet laser

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    SYSNO ASEP0328393
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleModelling of capillary Z-pinch recombination pumping of boron extreme ultraviolet laser
    TitleModelování kapilárního Z-pinče pro rekombinační boronový UV laser
    Author(s) Vrba, Pavel (UFP-V) RID
    Bobrova, N. A. (RU)
    Sasorov, P. V. (RU)
    Vrbová, M. (CZ)
    Hübner, Jakub (UFP-V)
    Source TitlePhysics of Plasmas - ISSN 1070-664X
    Roč. 16, č. 7 (2009), 073105 1-073105 11
    Number of pages11 s.
    Publication formweb - web
    Languageeng - English
    CountryUS - United States
    KeywordsBoron ; capillary ; discharges (electric ; laser ablation ; optical pumping ; plasma heating by laser ; plasma kinetic theory ; plasma magnetohydrodynamics ; Z pinch
    Subject RIVBL - Plasma and Gas Discharge Physics
    R&D ProjectsGA102/07/0275 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z20430508 - UFP-V (2005-2011)
    UT WOS000268615200047
    DOI10.1063/1.3160610
    AnnotationComputer modeling of fast capillary discharge is performed to investigate a new laser active medium created by excited hydrogenlike boron ions leading to lasing at 26.23 nm. Recombination excitation of the boron ions is expected in the undercooled pinching plasma created during the expansion phase of the pinch. Plasma dynamics is described by the magnetohydrodynamic code NPINCH and the plasma ion kinetics is evaluated according to the FLY code. Results of simulations for capillary filled with boron are reported and compared with previous results achieved for nitrogen filled capillary. In both cases, the same nonablative capillary with radius of 1.6 mm is presumed and the current pulse with peak value 50 kA and 1012 A.s−1 current slope are taken into account. Evaluated pressure optimized gains are 1.04 and 0.11 cm−1 are found for boron and nitrogen filled capillary, respectively. Capillary wall ablation is then also assayed.
    WorkplaceInstitute of Plasma Physics
    ContactVladimíra Kebza, kebza@ipp.cas.cz, Tel.: 266 052 975
    Year of Publishing2010
Number of the records: 1  

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