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Measurements of plasma parameters during Ba.sub.x./sub.Sr.sub.1-x./sub.TiO.sub.3./sub. thin films deposition by double hollow cathode plasma jet system

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    SYSNO ASEP0324065
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleMeasurements of plasma parameters during BaxSr1-xTiO3 thin films deposition by double hollow cathode plasma jet system
    TitleMěření parametrů plazmatu během depozice tenkých vrstev BaxSr1-xTiO3 pomocí dvoutryskového plazmatického systému s efektem duté katody
    Author(s) Olejníček, Jiří (FZU-D) RID, ORCID
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Virostko, Petr (FZU-D)
    Deyneka, Alexander (FZU-D)
    Jastrabík, Lubomír (FZU-D) RID, ORCID
    Adámek, P. (CZ)
    Šícha, M. (CZ)
    Tichý, M. (CZ)
    Šíchová, H. (CZ)
    Source TitleCzechoslovak Journal of Physics. - New York : Springer Science. - : Business Media - ISSN 0011-4626
    Roč. 56, Suppl. B (2006), B1283-B1289
    Number of pages7 s.
    Languageeng - English
    CountryCZ - Czech Republic
    KeywordsBSTO thin films ; hollow cathode sputtering ; Langmuir probe ; emission spectroscopy
    Subject RIVBH - Optics, Masers, Lasers
    CEZAV0Z10100522 - FZU-D (2005-2011)
    UT WOS000241337100005
    AnnotationPulse modulated double hollow cathode plasma jet system was used for deposition of BaxSr1-xTiO3 (BSTO) thin films on Si and on multi-layer Si/SiO2/TiO2/Pt substrates. Both separate nozzles made of BaTiO3 and SrTiO3 ceramics were reactively sputtered in the RF modulated plasma jet. Electron density, electron temperature and electron energy probability function were determined by Langmuir probe. Temperature of neutral particles and ratio of sputtered atoms (especially Ba and Sr) were estimated by optical emission spectroscopy. High correlation between ratio of spectral intensity of Ba and Sr lines and ratio of Ba and Sr atoms in BSTO thin film was observed. Knowledge of this correlation was used for deposition of compositional gradient BSTO thin films.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2009
Number of the records: 1