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Measurements of plasma parameters during Ba.sub.x./sub.Sr.sub.1-x./sub.TiO.sub.3./sub. thin films deposition by double hollow cathode plasma jet system
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SYSNO ASEP 0324065 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Measurements of plasma parameters during BaxSr1-xTiO3 thin films deposition by double hollow cathode plasma jet system Title Měření parametrů plazmatu během depozice tenkých vrstev BaxSr1-xTiO3 pomocí dvoutryskového plazmatického systému s efektem duté katody Author(s) Olejníček, Jiří (FZU-D) RID, ORCID
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Virostko, Petr (FZU-D)
Deyneka, Alexander (FZU-D)
Jastrabík, Lubomír (FZU-D) RID, ORCID
Adámek, P. (CZ)
Šícha, M. (CZ)
Tichý, M. (CZ)
Šíchová, H. (CZ)Source Title Czechoslovak Journal of Physics. - New York : Springer Science. - : Business Media - ISSN 0011-4626
Roč. 56, Suppl. B (2006), B1283-B1289Number of pages 7 s. Language eng - English Country CZ - Czech Republic Keywords BSTO thin films ; hollow cathode sputtering ; Langmuir probe ; emission spectroscopy Subject RIV BH - Optics, Masers, Lasers CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000241337100005 Annotation Pulse modulated double hollow cathode plasma jet system was used for deposition of BaxSr1-xTiO3 (BSTO) thin films on Si and on multi-layer Si/SiO2/TiO2/Pt substrates. Both separate nozzles made of BaTiO3 and SrTiO3 ceramics were reactively sputtered in the RF modulated plasma jet. Electron density, electron temperature and electron energy probability function were determined by Langmuir probe. Temperature of neutral particles and ratio of sputtered atoms (especially Ba and Sr) were estimated by optical emission spectroscopy. High correlation between ratio of spectral intensity of Ba and Sr lines and ratio of Ba and Sr atoms in BSTO thin film was observed. Knowledge of this correlation was used for deposition of compositional gradient BSTO thin films. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2009
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