Number of the records: 1  

Deposition of nanocrystalline and microcrystalline Ba.sub.x./sub.Sr.sub.1-x./sub.TiO.sub.3./sub. by means of pulse modulated low pressure plasma jet system

  1. 1.
    SYSNO ASEP0323878
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleDeposition of nanocrystalline and microcrystalline BaxSr1-xTiO3 by means of pulse modulated low pressure plasma jet system
    TitleDepozice nanokrystalického a mikrokrystalického BaxSr1-xTiO3 pomocí pulzně modulovaného nízkotlakého systému s plazmovou tryskou
    Author(s) Olejníček, Jiří (FZU-D) RID, ORCID
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Virostko, Petr (FZU-D)
    Deyneka, Alexander (FZU-D)
    Jastrabík, Lubomír (FZU-D) RID, ORCID
    Chvostová, Dagmar (FZU-D) RID, SAI, ORCID
    Šíchová, Hana (FZU-D)
    Pokorný, Jan (FZU-D) RID, ORCID
    Number of authors8
    Source TitleIntegrated Ferroelectrics - ISSN 1058-4587
    Roč. 81, č. 1 (2006), s. 227-237
    Number of pages11 s.
    Languageeng - English
    CountryGB - United Kingdom
    Keywordsferroelectric thin films ; hollow cathode sputtering ; emission spectroscopy
    Subject RIVBM - Solid Matter Physics ; Magnetism
    CEZAV0Z10100522 - FZU-D (2005-2011)
    UT WOS000239819400019
    DOI10.1080/10584580600685535
    AnnotationModulated RF plasma jet system was used for deposition of BaxSr1-xTiO3 and SrTiO3 thin films.Optical emission spectroscopy of the plasma was used for control of concentration of particles sputtered from the hollow cathode.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2009
Number of the records: 1  

  This site uses cookies to make them easier to browse. Learn more about how we use cookies.