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Thickness dependence of nanofilm elastic modulus

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    SYSNO ASEP0323549
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleThickness dependence of nanofilm elastic modulus
    TitleZávislost modulu pružnosti nanofilmu na jeho tloušťce
    Author(s) Fedorchenko, Alexander I. (UT-L) RID
    Wang, A. B. (TW)
    Cheng, H.H. (TW)
    Source TitleApplied Physics Letters. - : AIP Publishing - ISSN 0003-6951
    Roč. 94, č. 15 (2009), s. 152111-152113
    Number of pages3 s.
    Languageeng - English
    CountryUS - United States
    Keywordsnanofilm ; elastic modulus ; thickness dependence
    Subject RIVBM - Solid Matter Physics ; Magnetism
    CEZAV0Z20760514 - UT-L (2005-2011)
    UT WOS000265285200045
    DOI10.1063/1.3120763
    AnnotationYoung’s modulus is a fundamental physical parameter that determines both the mechanic and electronic properties of a solid thin film. In here, we show that the elastic modulus is not a constant as that of conventional treatment but varies with film thickness. It has been shown that there exists some film thickness hb when the surface energy comes into play. The hb is inverse proportional to the bulk Young’s modulus and depends strongly on the in-plain strain. For Si nanofilms, the dimensionless elastic modulus E/Ebulk can be presented as a power function of the dimensionless film thickness h/hb.
    WorkplaceInstitute of Thermomechanics
    ContactMarie Kajprová, kajprova@it.cas.cz, Tel.: 266 053 154 ; Jana Lahovská, jaja@it.cas.cz, Tel.: 266 053 823
    Year of Publishing2010
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