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Growth and properties of InAs/In.sub.x./sub.Ga.sub.1-x./sub.As/GaAs quantum dot structures

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    SYSNO ASEP0308047
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JOstatní články
    TitleGrowth and properties of InAs/InxGa1-xAs/GaAs quantum dot structures
    TitleRůst a vlastnosti InAs/InxGa1-xAs/GaAs struktur s kvantovými tečkami
    Author(s) Hulicius, Eduard (FZU-D) RID, ORCID, SAI
    Oswald, Jiří (FZU-D) RID, ORCID
    Pangrác, Jiří (FZU-D) RID, ORCID, SAI
    Vyskočil, Jan (FZU-D) RID
    Hospodková, Alice (FZU-D) RID, ORCID, SAI
    Kuldová, Karla (FZU-D) RID, ORCID
    Melichar, Karel (FZU-D)
    Šimeček, Tomislav (FZU-D)
    Source TitleJournal of Crystal Growth. - : Elsevier - ISSN 0022-0248
    Roč. 310, 7-9 (2008), s. 2229-2233
    Number of pages5 s.
    Languageeng - English
    CountryNL - Netherlands
    Keywordsnanostructures ; metalorganic vapor-phase epitaxy ; semiconducting III–V materials
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsKJB101630601 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    IAA100100719 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    GA202/06/0718 GA ČR - Czech Science Foundation (CSF)
    GA202/05/0242 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z10100521 - FZU-D (2005-2011)
    DOI10.1016/j.jcrysgro.2007.11.055
    AnnotationSingle- and double-layer InAs/GaAs quantum dot structures with strain-reducing layers (SRLs) were prepared by metalorganic vaporphase epitaxy using the Stranski–Krastanow growth mode. Structures were studied in-situ by reflectance anisotropy spectroscopy (RAS), and ex-situ by photoluminescence (PL). These structures, with very intense room temperature PL at wavelengths from 1.25 to 1.55 μm according to growth and structure parameters, were grown along while monitored with RAS. Strong correlation between RAS signal and PL intensity was found. Dependence of PL emission maximum position on SRL composition and capping layer thickness is shown.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2008
Number of the records: 1  

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