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Chemical Reaction Equilibrium in Nanoporous Materials: NO Dimerization Reaction in Carbon Slit Nanopores

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    SYSNO ASEP0049463
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JOstatní články
    TitleChemical Reaction Equilibrium in Nanoporous Materials: NO Dimerization Reaction in Carbon Slit Nanopores
    TitleChemicko-reakční rovnováha v nanoporézních materiálech: NO dimerizační reakce v rovinných uhlíkových nanopórech
    Author(s) Lísal, Martin (UCHP-M) RID, ORCID, SAI
    Brennan, J.K. (US)
    Smith, W.R. (CA)
    Source TitleJournal of Chemical Physics. - : AIP Publishing - ISSN 0021-9606
    Roč. 124, č. 6 (2006), s. 64712.1-64712.14
    Number of pages14 s.
    Languageeng - English
    CountryUS - United States
    Keywordsnanopore ; NO dimerization ; reaction
    Subject RIVCF - Physical ; Theoretical Chemistry
    R&D ProjectsGA203/05/0725 GA ČR - Czech Science Foundation (CSF)
    1ET400720507 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    1ET400720409 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    CEZAV0Z40720504 - UCHP-M (2005-2011)
    AnnotationWe present a molecular-level simulation study of the effects of confinement on chemical reaction equilibrium in nanoporous materials.We use the reaction ensemble Monte Carlo (RxMC) method to investigate the effects of temperature, nanopore size, bulk pressure, and capillary condensation on the nitric oxide dimerization reaction in a model carbon slit nanopore in equilibrium with a bulk reservoir. In addition to the RxMC simulations, we also utilize the molecular-dynamics method to determine self-diffusion coefficients for confined nonreactive mixtures of nitric oxide monomers and dimers at compositions obtained from the RxMC simulations. We analyze the effects of the temperature, nanopore width, bulk pressure, and capillary condensation on the reaction equilibrium with respect to the reaction conversion, fluid structure, and self-diffusion coefficients.
    WorkplaceInstitute of Chemical Process Fundamentals
    ContactEva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
    Year of Publishing2007
Number of the records: 1  

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